Computational Lithography & Inspection - Luminescent Technologies
advanced nodes, since aggressive OPC, ILT, and SMO make masks more ... sensitivity of the inspection system in order to reduce the number of defects ... itself, a real mask pattern recovery or reconstruction is needed before any .... Defect types. Simulated ref and def wafer contour. Multi def detection .... Particle- on-Clear.
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luminescenttechnologies's website is luminescenttechnologies.com